Magic in Minutes
Pattern Design Using Your Patterns
Sat, March 18, 2017, 9 AM — 4 PM
SEFAA – 3420 W. Hospital Ave. Suite #103 Chamblee, GA 30341
Oticca Beamer will share her expertise at an all-day, hands-on workshop that will walk you through the process for creating 5 collar designs, 3 sleeve designs and flounces using a bodice and set-in sleeve pattern that you already have. No need to purchase new patterns to get new looks! Pattern designing is fun and easy, and it gives you the freedom to create the fashion looks you want! You will be amazed at how easily and quickly you can design these different pattern pieces
Oticca Beamer is a Craftsy instructor (Patternmaking Essentials: The Tailored Jacket) and has been teaching pattern drafting and design for over 20 years. She learned the sewing basics at a very young age, and in 1986 learned sloper drafting, pattern design and pattern grading. Later, she founded her own company, Fit & Fashion. She has recently retired from her company, but continues to teach pattern making at sewing expos and group classes and continues to design patterns for her own wardrobe.
What You Will Learn:
• Curved Mandarin Collar
• Flat, Partial Roll and Full Roll Collar
• Convertible Collar
• Removing the Front Edge Seam from your Collar Pattern
• Shawl Collar
• Raglan Sleeve
• Cape Sleeve
• 2-Piece Jacket Sleeve
• Flounce (circular ruffles)
COST = $70 ($80 non-members) Lunch is included.
After March 1 Registration fee is NON- REFUNDABLE unless there is a waiting list.
Registration begins on-line January 15, 2017.
Questions? Contact Judy Stewart at 404-859-6836 or email@example.com.
What to Bring:
Students will need to bring the following supplies to class:
Paper scissors, 12” or 18” grid ruler, a yard stick, pencils, clean eraser, roll of regular scotch tape, and sewing tape measure. Pattern paper, bodice and sleeve templates, removable tape, design curves and printed instructions will be provided.
Note: Please do not bring markers…they can bleed through the pattern paper onto the tables that we will be using.